Jasco Analítica Spain, S.L. - Other laboratory equipment
Jasco
Cleaning of wafers with supercritical fluid systems: they provide a good quality in the micron range
The complexity of integrated circuits has been increasing significantly in recent years due to the improvement of lithographic technology. To provide a good quality in the range of microns in this type of sampling is important factors such as the cleaning of wafers are mounted where. Supercritical CO2 is offered as an excellent solvent cleaning for this type of samples due to its properties of low viscosity, high coefficient of diffusion, high permeability, devoid of surface tension, etc.
In addition, said supercritical fluid is transformed into gas when it reaches the atmospheric conditions, while a common solvent offers resistance to the microstructures and stresses on the surface of this type of samples. On the other hand, CO2 can penetrate into the interior of these microstructures without damaging his lithograph.
In addition, said supercritical fluid is transformed into gas when it reaches the atmospheric conditions, while a common solvent offers resistance to the microstructures and stresses on the surface of this type of samples. On the other hand, CO2 can penetrate into the interior of these microstructures without damaging his lithograph.
